KMP D3200 series photoresist is a wide-spectrum positive photoresist developed for liquid crystal display and touch screen production process. It can be used for roll coating, spin coating and Slit Coating. The photoresists are available in different models. The cloth method and film thickness have the advantages of fast photosensitive speed and large process window, and are widely used in the field of LCD/TP manufacturing.
KMP T3100 series photoresist is a wide-spectrum positive photoresist specially developed for large-size TFT-LCD/TP process. It has good film thickness uniformity when coating large panels, and the photospeed is fast (the film thickness is 1.5um). The photospeed is 40mJ/cm2). It is also suitable for different developer types, and has the advantages of good adhesion and excellent wet etching resistance. It is widely used in the field of large-size TFT-LCD/TP manufacturing.