CMP Head

Description

Shanghai Runpin Electronic Materials Co., Ltd., often referred to as "Runpin Electronics," specializes in the realm of Chemical Mechanical Polishing (CMP) materials utilized in the manufacturing of semiconductor chips. The company is dedicated to delivering top-quality products and services to esteemed chip manufacturers. Their offerings encompass from polishing slurries and polishing pads to ultra-precise components for CMP polishing heads (including retaining rings and adsorption films), as well as assembly services. By providing these comprehensive solutions, Runpin Electronics plays a crucial role in safeguarding the supply chain integrity of China's semiconductor chip manufacturing industry.

  • CMP Head Consumables
    • Retainer Ring
    • Membrane
    • Rolling Seal

 

  • CMP Detail Parts List :

 

  • Manufacturing Process – Retainer Ring

    • Build of Material:            SUS with High-Grade PPS, PEEK, PET, PAI
    • Applications:                    AMAT 7-zone EVO, 5-zone Contour; EBARA G3, Gx
    • Capacity:                           60,000 pcs/year, 60% utilization ratio

 

  • Manufacturing Process – Membrane

    • Build of Material:            High-Grade Silicone
    • Applications:                    AMAT 7-zone EVO, 5-zone Contour; EBARA G3, Gx
    • Capacity:                           30,000 pcs/year, 40% utilization ratio

 

  • CMP Head Non-consumable parts

 

  • Head Rebuild Service

 

  • Head rebuild COA include retaining ring, membrane and leak test data

 

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